PECVD magnetron sputtering coating production line

This production line uses RF ion CVD technology. It has fast deposition rate, good film quality features. It can coat large size plain oxide film, nitride film, oxynitride film, a silicon film and amorphous silicon carbide film.

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PECVD magnetron sputtering coating production line uses RF ion CVD technology. It has fast deposition rate, good film quality features. It can coat large size plain oxide film, nitride film, oxynitride film, a silicon film and amorphous silicon carbide film.

Composition and system:
1、PECVD magnetron production line is composed of eight chamber,namely: transition chamber - heating chamber -RF I -RF II chamber -RF III chamber -RF IV chamber - cooling chamber - transition chamber.
2、PECVD magnetron production line is composed of inlet platform system, outlet platform system, pallet return system, whole machine system, vacuum unit system, workpiece and fixture drive systems, vacuum measurement and pressure control system, workpiece baking systems, cooling water and compressed air distribution systems, operation control system.

1.Ultimate vacuum:7x10-4Pa.                    

2.Production cycle40~120 S/frame

3.Basic frame size:859*1500mm (can be customized) 

4.Film uniformity:±2%

5.Film stability:up to international standards

Category: oxide film, nitride film, oxynitride film, silicon film and amorphous silicon carbide films.
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