Import molecular pump

Multi-axis magnetic bearing system for hanging from the rotor during operation to ensure that the risk of pollution, while the vibration, noise and maintenance requirements to a minimum, the molecular pump to be fully connected with a variety of advanced controllers, which can be used for multi-kinds of applications and processes, reliability and excellent performance through the test of practice can achieve maximum process flexibility.

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Multi-axis magnetic bearing system for hanging from the rotor during operation to ensure that the risk of pollution, while the vibration, noise and maintenance requirements to a minimum, the molecular pump to be fully connected with a variety of advanced controllers, which can be used for multi-kinds of applications and processes, reliability and excellent performance through the test of practice can achieve maximum process flexibility. 

Features and Benefits: 
Advanced rotor technology 
• The maximum process flexibility 
• No oil 
• Low vibration 
• Highly reliable 
• Maintenance-free 

Advanced controller design 
• Automatic adjustment 
• self-diagnostic function 
• DC motor drive 
• No battery operation 

Compact design 
• Small footprint 
• Half Rack Controller

Intake flange ISO100,CF100
Exit KF25
Pumping speed
  N2 300 ls-1
  H2 300 ls-1
 Compression ratio
  N2 >108
  H2 >2 x 104
The limit pressure of heating (VG/ISO flange 6.5 x 10-6 Pa (5 x 10-8 Torr)
The limit pressure of heating (ICF flange 10-8 Pa (10-10 Torr)
The maximum allowable inlet pressure (air cooling 0.066 Pa (5 x 10-4 Torr)
Maximum continuous discharge pressure (air cooling 13 Pa (0.1 Torr)
nominal speed 48000 rpm
starting time 3 min
Maximum inlet flange temperature 120 °C
input voltage 100 to 120 (± 10%) V alternating current or
200 to 240 (± 10%) V alternating current
Startup of the power consumption 0.55 kVA
Pump weight 11 kg
weight of the controller 7 kg
Metal (Al), tungsten and dielectric (oxide) and plasma etching of polysilicon (chloride, fluoride, and bromide); Electron cyclotron resonance (ECR) etching; Film deposition CVD, PECVD, ECRCVD, MOCVD; Sputtering; Ion implantation source, beam line pumping end station; MBE ; Diffusion ; Photo resist stripping ; Crystal / crystal film growth; Wafer inspection ; Load-lock vacuum chamber; Scientific instruments: surface analysis, mass spectrometry, electron microscopy; High energy physics: beam line, accelerator ; Radiation applications: fusion systems, cyclotron
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