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Based on our proprietary PMA II and EFC patented technologies, we have developed a new-generation multifunctional coating system. The system supports flexible integration with ARC, Magnetron Sputtering (MS), and HiPIMS processes, meeting diverse coating requirements for cutting tools, molds, components, and carbon-based coatings such as DLC, GLC, and ta-C.
Our systems are widely applied in research, semiconductor, cutting tool, mold, medical device, and new energy industries. We enable the deposition of various nitride coatings, including AlTiN, TiAlN, AlTiXN, AlCrN, AlCrXN, TiSiN, CrN, and TiN, as well as carbon-based and PECVD coatings such as ta-C, graphite-like carbon, Cr+a-C, Cr+a-C:H, W+a-C, and W+a-C:H.
Our coating solutions help customers increase machining efficiency, extend tool life, reduce overall production costs, and achieve high-efficiency, high-quality manufacturing.
Key Features of Diamond-like Carbon DLC Coating Machine
Small footprint, easy to integrate into the factory
Uniform deposition rate in the whole chamber
Easy to operate and maintain
Flexible combination of various technologies
Low coating cost per piece
Local or remote monitoring of coating process
The innovative APA evaporator technology (Advanced Plasma Assisted) is based on cathodic vacuum arc and offers diverse development possibilities for new layer architectures.
Benefits:
●High target utilisation result in low target costs
●High deposition rates
●Adjustable magnetic fields
●Short target changing times
●High plasma density
●Reduction of macro-particles
●Excellent coating adhesion
HiPIMS stands for High-Power Impulse Magnetron Sputtering.
Benefits:
●High ionisation rate (similar to arc)
●High power densities from 100 to 1000 W/cm2
●Very high plasma density
●Layer structures adjustable by plasma parameter settings
●Very smooth coatings
●Excellent coating adhesion
●Deposition of dense coatings at low substrate temperatures
In the sputtering process, atoms are extracted from a target by bombardment with high-energy ions (Ar) and transformed into the gas phase. By combining the sputtered material with additional gases, a coating is deposited on the substrate.
Benefits:
● A wide range of materials can be sputtered
● Diverse process variants available
● Smooth coatings
● Good coating adhesion on combination with power etching prozess AEGD
With the nitriding module, a plasma nitriding process can be performed before a PVD and/or PACVD coating process in one system and one batch. Thereby a hardened layer can be produced which offers excellent support for the subsequent PVD/PACVD coating.
Benefits:
● Optimisation of tool and component properties
● Substitution of expensive base materials
● Significantly longer lifetimes
● All PVD coatings can be applied
DLC stands for Diamond-Like Carbon and refers to a group of extremely low friction amorphous carbon coatings. With the DLC module, different DLC coatings can be produced by using PVD and/or PACVD processes. Standard DLC coatings consist of metal free or metal containing carbon coatings.
Benefits:
● Excellent coating adhesion
● High wear resistance
● Low coefficient of friction
● Smooth coatings
ta-C stands for tetrahedral amorphous carbon without hydrogen and refers to a group of extremely hard and low friction amorphous carbon coatings. With the ta-C module different ta-C coatings can be produced.
Benefits:
● For higher temperature environments than DLC
● Very high wear resistance
● Excellent coating adhesion
● Smooth coatings
| Mode | HCSH-400 |
| Usable Plasma Coating area | D400×H450mm |
| Max Working Temperature | 550℃ |
| Technology Characteristic | PMAⅡ AEG HIPIMS |
| Pretreatment | ARC, AEG, DC, MF, HIPIMS |
| Cathode | D120 / D160 / W125 |
| Ultimate Vacuum | Ultimate Vacuum ≤5×10-4Pa Work Vacuum ≤5×10-3Pa |
| Process Cycle | From closing to opening 4~5h TiN：2~2.5um TiAlN：2~2.5um TiSiN：2~3.5um |
| Machine Configuration | Magnetically Levitated Molecular Pump Pulse Bias Supply PC Intelligent Control System |
| Standard Shaft | D140×4 axis |
| Max Loading Capacity | 200KG |
| Remark | Adopt the sputtering(UBM, RF, etc.)，the effective height will be reduced Online Service Support System |
| Mode | HCSH-650 |
| Usable Plasma Coating area | D650×H750mm |
| Max Working Temperature | 550℃ |
| Technology Characteristic | PMAⅡ AEG HIPIMS |
| Pretreatment | ARC, AEG, DC, MF, HIPIMS |
| Cathode | D120 / D160 / W125 |
| Ultimate Vacuum | Ultimate Vacuum ≤5×10-4Pa Work Vacuum ≤5×10-3Pa |
| Process Cycle | From closing to opening 5~8h TiN：2~2.5um TiAlN：2~2.5um TiSiN：2~3.5um |
| Machine Configuration | Magnetically Levitated Molecular Pump Pulse Bias Supply PC Intelligent Control System |
| Standard Shaft | D140×8 axis |
| Max Loading Capacity | 500KG |
| emark | Adopt the sputtering(UBM, RF, etc.)，the effective height will be reduced Online Service Support System |
| Mode | HCSH-900 |
| Usable Plasma Coating area | D900×H1200mm |
| Max Working Temperature | 550℃ |
| Technology Characteristic | PMAⅡ AEG HIPIMS |
| Pretreatment | ARC, AEG, DC, MF, HIPIMS |
| Cathode | D120 / D160 / W125 |
| Ultimate Vacuum | Ultimate Vacuum ≤5×10-4Pa Work Vacuum ≤5×10-3Pa |
| Process Cycle | From closing to opening 7~10h TiN：2~2.5um TiAlN：2~2.5um TiSiN：2~3.5um |
| Machine Configuration | Magnetically Levitated Molecular Pump ×2 Pulse Bias Supply PC Intelligent Control System |
| Standard Shaft | D140×12 axis |
| Max Loading Capacity | 500KG |
| emark | Adopt the sputtering(UBM, RF, etc.)，the effective height will be reduced Online Service Support System |
| Mode | HCSH-1800 |
| Usable Plasma Coating area | D900×H1500mm |
| Max Working Temperature | 550℃ |
| Technology Characteristic | PMAⅡ AEG HIPIMS |
| Pretreatment | ARC, AEG, DC, MF, HIPIMS |
| Cathode | D120 / D160 / W125 |
| Ultimate Vacuum | Ultimate Vacuum ≤5×10-4Pa Work Vacuum ≤5×10-3Pa |
| Process Cycle | From closing to opening 7~10h TiN：2~2.5um TiAlN：2~2.5um TiSiN：2~3.5um |
| Machine Configuration | Magnetically Levitated Molecular Pump ×2 Pulse Bias Supply PC Intelligent Control System |
| Standard Shaft | D140×12 axis |
| Max Loading Capacity | 500KG |
| emark | Adopt the sputtering(UBM, RF, etc.)，the effective height will be reduced Online Service Support System |
Looking for a solution tailored to your needs? Our team is ready to provide you with expert guidance and support.
