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Designed for advanced optical manufacturing, the system serves demanding applications such as laser optics, telecom filters, ultra-high-reflectivity mirrors, scientific optics, semiconductor optics, and integrated photonics.
It enables the production of multilayer dielectric coatings, low-loss AR coatings, high-reflectivity coatings, low-stress optical films, and complex spectral thin-film structures with exceptional precision and consistency.
Ion Beam Sputtering (IBS) technology utilizes high-energy ion beams to bombard the target, causing target materials to be sputtered as single atoms or molecules and deposited onto the substrate, forming high-performance optical thin films characterized by high density, low defects, low scattering, and low absorption.
This technology is suitable for the fabrication of precision optical devices requiring high reliability, high stability, and stringent spectral control.
Compared with conventional evaporation coating and magnetron sputtering, this system offers distinct advantages in:
• Film Quality
High density with low defects, ultra-low absorption and low scattering, and excellent surface roughness.
• Environmental & Mechanical Properties
High environmental stability and low stress.
• Process Control
High spectral accuracy and high-uniformity multilayer deposition.
The system also supports ion assistance and optical monitoring, enabling real-time, precise feedback on film thickness and stress regulation.
In laser, telecom and photonic integration applications, optical coatings have evolved from simple reflective and anti-reflective layers into critical functional layers that determine system stability, spectral precision and long-term reliability.
Through dense IBS coatings, high-precision spectral control and low-scattering process capability, the HCIBS platform supports high-value applications including laser mirrors, narrow-band filters, telecom WDM devices, CPO optical interfaces, scientific optics and semiconductor photonic integration.
The platform supports engineering-scale production of high-reflection coatings, low-loss AR coatings, bandpass / edge / notch filters, multilayer dielectric stacks, low-stress mirror coatings and complex spectral thin-film systems.
| Model | HCIBS-1100 | HCIBS-1400 | |
| Application | Laser | 1Xφ400mm(Substrate) | 2Xφ400mm(Substrate) |
| Telecom | 4Xφ200mm（12″) | 4Xφ350mm（12″) | |
| Medical/Metrology/Microscopy | 4Xφ350mm(Substrate) | / | |
| Coating | Ta,Mo,Si,SiO2 (3-Target Assembly） | ||
| Sources | Primary source aperture 160mm/230mm, Auxiliary source aperture 120mm/120mm | ||
| Thickness Monitor | Time-based control + quartz crystal thickness monitoring (optional optical monitoring) | ||
Looking for a solution tailored to your needs? Our team is ready to provide you with expert guidance and support.
