There are many kinds of coating methods for vacuum coating machine. Different workpieces and films are coated, different process requirements, and different coating methods are used. The commonly used coating processes on the market include vacuum evaporation, sputtering, ion plating (hollow cathode Ion plating, hot cathode ion plating, arc ion plating, reactive reactive ion plating, radio frequency ion plating, DC discharge ion plating), these common coating processes are often used in daily life. Introduce in detail:

The first type: electron beam evaporation:
        Electron beam evaporation is to use a focused electron beam to heat the evaporation source, make it evaporate and deposit on the surface of the substrate to form a thin film. Features: vacuum environment; the evaporation source material needs to be heated and melted; the base material is also at a higher temperature; the vaporized gas is controlled by a magnetic field, thereby controlling the thickness of the resulting coating.
The second: sputter deposition
        Sputtering is a thin film deposition technique associated with gas glow discharge. There are many sputtering methods, such as DC sputtering, RF sputtering and reactive sputtering, etc., and magnetron sputtering, intermediate frequency sputtering, DC sputtering, RF sputtering and ion beam sputtering are more used. Features: The inert gas (such as argon) required for discharge is charged into the vacuum chamber, and a large number of positive ions are generated by the ionization of gas molecules under the action of a high-voltage electric field. The charged ions are accelerated by a strong electric field, forming a high-energy ion stream that bombards the evaporation source material (called the target). Under ion bombardment, atoms of the evaporated source material will leave the solid surface, sputtered onto the substrate at high speed and deposited as a thin film.
The third type: RF (radio frequency) sputtering
         The frequency used for RF sputtering is about 13.56MHz, which does not require a hot cathode and can sputter at lower gas pressure and lower voltage. RF sputtering can not only deposit metal films, but also deposit insulating dielectric films of various materials, so it is widely used
Fourth: arc ion plating
        Cathodic arc technology is to ionize the target material into an ionic state through low voltage and high current under vacuum conditions, so as to complete the deposition of thin film materials. This technology has a higher ionization rate and better film performance.
Fifth: filter cathodic arc
         Filtering Cathode Arc (FCA) is equipped with an efficient electromagnetic filter system, which can filter out the macroscopic large particles in the plasma generated by the arc source, so the prepared film is very dense and smooth, with good corrosion resistance, and the combination with the body Powerful.
The sixth type: ion beam
         Ion beam processing is to generate electron beams from an electron gun under vacuum conditions, and then introduce them into an ionization chamber that has been evacuated and filled with inert gas to ionize the low-pressure inert gas. The cations extracted from the negative electrode are accelerated, clustered and other steps to obtain ions with a certain speed and projected onto the surface of the material, resulting in sputtering effect and injection effect. Because ions are positively charged and their mass is thousands or tens of thousands of times larger than electrons, ion beams have greater impact kinetic energy than electron beams, and are processed by microscopic mechanical impact energy.
         These six vacuum coating machine coating processes are relatively common in daily life and are also the most widely used, basically covering the coating process of the entire coating industry.