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Advantages of sputtering coating film of pvd coating machine

2022-07-06

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Many products on the market are coated by magnetron sputtering. Magnetron sputtering technology is the most common coating method and is also favored by many pvd coating machine manufacturers. Then pvd coating machine magnetron sputtering coating What are the advantages of the film layer, the following is a detailed introduction to the vacuum editor:


pvd coating machine


Vacuum coating is performed by sputtering. Due to the different coating methods, the film prepared by the same coating material will have different effects. Although it cannot be seen by the naked eye, it does have certain advantages.
       The film thickness stability is good. Since the thickness of the sputtering coating layer has a great relationship with the target current and discharge current, the higher the current, the greater the sputtering efficiency, and the thickness of the coating layer is relatively large at the same time. Because as long as the current value is well controlled, how thick or thin the film needs to be plated is fine. Of course, this thickness is within the allowable range, and if the current is well controlled, no matter how many times the plating is repeated, the film thickness will not change. The stability of the film thickness can be attributed to the good controllability and repeatability of the film thickness.
        The film layer has a strong bonding force. During the sputtering process, some electrons hit the surface of the substrate, activate the surface atoms, and produce a cleaning effect, and the energy obtained by the sputtering of the coating material is 1 higher than that obtained by evaporation. To 2 orders of magnitude, when the coating atoms with such high energy hit the surface of the substrate, there is more energy that can be transferred to the substrate, generating more thermal energy, accelerating the movement of the atoms activated by electrons, and partially. The atoms of the coating material fuse with each other earlier, and other atoms of the coating material are deposited one after another to form a film, which strengthens the bonding force between the film and the substrate.
       The range of coating materials is wide, because the sputtering coating of the pvd coating machine is sputtered by the high-speed bombardment of argon ions, unlike the evaporation coating, which is limited to the coating material with a relatively low melting point due to the melting point. Coating almost all solid substances can be used as coating materials.
      From the above points, it can be seen that sputtering vacuum coating is indeed better than evaporation vacuum coating. The difference in principle determines that the thickness of the film prepared by sputtering is more stable, the bonding force is stronger, and the range of coating materials is wider.