The vacuum evaporation vacuum coating machine is mainly used to evaporate metal films (aluminum, chromium, tin, stainless steel and other metals), colorful film imitation gold film, etc. on the surface of the plastic, ceramic and other products that have been treated, so as to obtain bright, beautiful and inexpensive plastic and ceramic surface metallized products. It is widely used in arts and crafts, decoration, lamps, furniture, toys, wine bottle covers, women's shoes heels and other fields. JTPZ multi-function coating technology and equipment (with RF plasma polymerization evaporation coating machine) are designed for automobile and motorcycle lamps. Evaporative aluminum coating and RF plasma coating protective film are completed in a vacuum chamber. After coating, the lamps have the "three proofing" function. RF plasma polymer film is also used in optical products, magnetic recording media, military defense protection film; Moistureproof antireflection film; Rust and corrosion resistance; Wear resistant hardening film. The user chooses to spray primer, aluminized film, protective film on the lamp base, or pre-treatment (without spraying primer), aluminized film, and protective film on the lamp base in the vacuum chamber. The film is directly coated on ABS, PC, PBT, PE, PP, PA66 and other plastic substrates without spraying primer or finishing paint (no investment in spraying equipment). After the aluminum film is coated, a protective film is directly coated. Dropping 1% NaOH solution for 10 minutes will not corrode the aluminum layer, and the aluminum layer will not fall off after being soaked in deionized water for 96 hours.

The preparation of film in vacuum of evaporation vacuum coating machine can prevent the pollution of film material and the surface of plating piece, eliminate space collision, improve the compactness of coating and prepare special functional coating of single compound. For large area coating, rotating substrate or multiple evaporation sources are often used to ensure the uniformity of film thickness. The film thickness is determined by the evaporation rate and time of the evaporation source (or by the charge amount), and is related to the distance between the source and the substrate. The distance from the evaporation source to the substrate should be less than the average free path of the vapor molecules in the residual gas, so as to avoid the chemical reaction caused by the collision between the vapor molecules and the residual gas molecules. The exhaust system is generally composed of mechanical pump, diffusion pump, pipeline and valve. At present, the evaporation sources mainly include resistance heating, electron beam heating, induction heating, arc heating and laser heating. The average kinetic energy of vapor molecules is about 0.1~0.2 electron volts. The film thickness can range from hundreds of angstroms to several microns.