HCCMS series

Compact Multifunctional

sputtering coating equipment

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Load-lock type Sputtering System Compact multifunctional sputtering coating machine

Load-lock type Sputtering System Characteristic:

Redesign ease of use by leveraging traditional process data and proprietary technology

Increase productivity by installing a box mechanism (optional) in the load locking chamber

Support multi cathode stacking / simultaneous sputtering

The labor-saving operation is realized through the automatic processing of touch panel and formula input

Data recording is possible

Application:

Electrode film forming / multilayer electrode and simultaneous film forming applications

Dielectric film forming, insulating film, passivation, protective film, etc.

Used for R & D and small-scale production of electronic components

Main modules
Arc HiPIMS
The innovative APA evaporator technology (Advanced Plasma Assisted) is based on cathodic vacuum arc and offers diverse development possibilities for new layer architectures.
Benefits:
●High target utilisation result in low target costs
●High deposition rates
●Adjustable magnetic fields
●Short target changing times
●High plasma density
●Reduction of macro-particles
●Excellent coating adhesion
HiPIMS stands for High-Power Impulse Magnetron Sputtering.
Benefits:
●High ionisation rate (similar to arc)
●High power densities from 100 to 1000 W/cm2
●Very high plasma density
●Layer structures adjustable by plasma parameter settings
●Very smooth coatings
●Excellent coating adhesion
●Deposition of dense coatings at low substrate temperatures
Additional modules
Sputter Nitriding
In the sputtering process, atoms are extracted from a target by bombardment with high-energy ions (Ar) and transformed into the gas phase. By combining the sputtered material with additional gases, a coating is deposited on the substrate.
Benefits:
● A wide range of materials can be sputtered
● Diverse process variants available
● Smooth coatings
● Good coating adhesion on combination with power etching prozess AEGD
With the nitriding module, a plasma nitriding process can be performed before a PVD and/or PACVD coating process in one system and one batch. Thereby a hardened layer can be produced which offers excellent support for the subsequent PVD/PACVD coating.
Benefits:
● Optimisation of tool and component properties
● Substitution of expensive base materials
● Significantly longer lifetimes
● All PVD coatings can be applied
DLC ta-C
DLC stands for Diamond-Like Carbon and refers to a group of extremely low friction amorphous carbon coatings. With the DLC module, different DLC coatings can be produced by using PVD and/or PACVD processes. Standard DLC coatings consist of metal free or metal containing carbon coatings.
Benefits:
● Excellent coating adhesion
● High wear resistance
● Low coefficient of friction
● Smooth coatings
ta-C stands for tetrahedral amorphous carbon without hydrogen and refers to a group of extremely hard and low friction amorphous carbon coatings. With the ta-C module different ta-C coatings can be produced.
Benefits:
● For higher temperature environments than DLC
● Very high wear resistance
● Excellent coating adhesion
● Smooth coatings

Product Advantage.

HCSH series Compact multifunctional sputtering coating machine includes the following key capabilities:
  • Compact

    Small footprint, easy to integrate into the factory

  • Low cost

    Low cost of single piece coating

  • Simple

    Easy to operate and maintain

  • Modularization

    Flexible combination of various technologies

  • Low temperature

    Low temperature process is suitable for metal and plastic parts

  • Remote access

    Provide factory remote diagnostics

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Would you like to know more?
Please contact us

E-mail: info@hcvac.com

Online Consultation

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