Magnetron sputtering vacuum coater is widely used in daily life, and it is also
very popular in the market. Therefore, everyone pays special attention to the
coating technology of magnetron sputtering vacuum coater. Today, Huicheng
vacuum editor introduces the main parameters that affect the sputtering of
magnetron sputtering vacuum coater.
I. Sputtering threshold: Minimum energy value of incident ions required for sputtering target
atoms. It has little to do with the
type of incident ions, but it has to do with the target. After the amount of energy ions exceeds the sputtering threshold, with the
increase of ion energy, the sputtering yield is proportional to the square of
ion energy before 150ev. In the range of 150ev~1kev,
the sputtering yield is proportional to the ion energy. In the range of 1kev~10kev, the sputtering yield does not change
significantly. With the increase of energy,
the sputtering yield shows a downward trend. The following are the sputtering thresholds of several metals bombarded by
different incident ions.
II. Sputtering yield: When the incident ions bombard the target, the average number of atoms
that each positive ion can hit from the target. The influencing factors mainly include the following aspects:
1. The sputtering yield shows a certain
periodicity with the change of target atomic number, and the sputtering yield
increases with the increase of electron filling degree of target atom D shell
(general change trend).
2. Influence of incident ion species on
sputtering yield Sputtering yield increases
periodically with the increase of incident atomic number. Sputtering yield of silver, copper and tantalum corresponding to various
incident ions of 45Kev.
3. Influence of ion incident angle on
sputtering yield. For the same target and
incident ions, the sputtering yield increases with the increase of incident
angle of ions, and the sputtering yield reaches the maximum when the angle
increases to 70 ~ 80. With increasing incident
angle, the sputtering yield decreases sharply, and the sputtering yield is zero
at 90℃.
4. Influence of target temperature on
sputtering yield. Generally speaking, within a
certain temperature range that can be considered that the sputtering yield is
closely related to sublimation energy, the sputtering yield hardly changes with
the change of temperature. When the temperature exceeds
this range, the sputtering yield tends to increase sharply.
The above two points are the biggest parameters
that affect the sputtering of magnetron
sputtering vacuum coating machine. The changes of these two parameters are
directly related to the film adhesion, film structure and other
characteristics, so the sputtering parameters are extremely important.
