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Introduction to Huicheng CVD Diamond machine

2022-10-14

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The raw materials of natural diamonds are not uncommon, that is, carbon. The formation conditions of diamonds are very harsh, and they can only be formed under a pressure environment of up to 1100-1500 ℃ and 45000-60000 atmospheres. The Earth's mantle layer just meets the conditions for diamond formation. Natural diamonds were born here and came to the earth's surface with volcanic movement. In natural diamonds, there are also quite a few industrial diamonds, and few diamonds can reach the jewelry level. In addition, it was very difficult to mine diamonds in the past, so diamonds have been monopolized by royalty and nobles for a long time.



At the beginning, man-made diamonds were designed to meet industrial needs, but gem grade diamonds are indeed scarce. Especially under the bombardment of advertisements, movies and TV dramas, people have regarded diamonds as a necessity for marriage, while natural diamonds have always been very expensive. Under this background, diamonds have been cultivated to enter the market strongly. The emergence of cultivated diamonds has stirred up the global diamond market, and people can no longer ignore its existence. Many jewelers have begun to enter the market to cultivate diamonds. Therefore, artificial diamond equipment came into being.
CVD  Diamond machine adopts microwave plasma CVD technology to heat natural gas and hydrogen and form carbon plasma in the pressure chamber. The plasma continuously deposits on the bottom carbon layer at the bottom of the pressure chamber, gradually accumulates and hardens to form diamond sheets.
The reaction rate of precursor is increased and the reaction temperature is reduced by plasma. It is suitable for preparing high-quality hard films and crystals with large area, good homogeneity, high purity and good crystal morphology. The plasma technology solves the limitations of traditional plasma technology. It can excite highly stable plasma clusters within the range of 10mbar to room pressure, reduce the changes in plasma state caused by fluctuations in air flow, air pressure, gas composition, voltage and other factors, ensure the continuity of single crystal growth, and provide a strong guarantee for the synthesis of large single crystal diamonds.
Application scope of CVD  Diamond machine: batch growth of high-quality single crystal diamond and polycrystalline diamond (large-sized gem grade single crystal diamond, highly oriented diamond crystal, nanocrystalline diamond, carbon nanotube/diamond-like carbon (DLC)), and film deposition and crystal synthesis of other hard materials such as Al2O3 and c-BN. CVD preparation of various films, surface treatment and modification of materials, growth of low-temperature oxides, etc. It is suitable for industrial production of optical, electronic, tool grade diamond film or single crystal, graphene, etc., material surface treatment, low-temperature oxide growth, etc.