One Axis magnetron sputtering coating machine

By combining high yield with excellent coating effect, HCMS-2000 enables the industry to meet the requirements of "just in time" manufacturing. HCMS-2000 is a batch sputtering system, which can handle the metallization of large substrates and provide a variety of coating processes, including color coating, gray and plasma enhancement system.

Rotary front door design, high production efficiency

The rotary front door allows high productivity processing and loading and unloading sequences.

The base plate can be conveniently loaded into the hanger or male rotating frame.

Widely used flexible sputtering system

Magnetron sputtering deposition for high-speed metal deposition, and reactive magnetron sputtering for deposition of metal nitride or metal oxide layers.

The advanced MF (intermediate frequency) PECVD deposition source allows the deposition of transparent topcoats and enhanced wipe resistant layers.

Efficient pumping units are easy to operate

A further key element is an efficient vacuum pump system, including an effective refrigeration coil system and a flexible process gas management system.