pvd coating machine
HiPIMS technology represents high-power pulse magnetron sputtering. Common magnetron sputtering technology is widely used in the field of thin film preparation. Decorative coating applications and tool coating applications are relatively common, but there are many magnetron sputtering processing technologies. limitations. For example, the power density of the magnetron sputtering target is limited by the thermal load of the target. That is, when the sputtering current is large, too many positive ions bombarding the target may overheat and burn the sputtering target. Problems such as low energy ionization rate of metals with limited energy. In recent years, a high-power pulsed magnetron sputtering (HiPIMS) technology has been developed at home and abroad, which has greatly weakened this limitation. The peak power of high-power pulsed magnetron sputtering is about 100 times that of ordinary magnetron sputtering. The ionization rate of sputtered materials is extremely high, and this highly ionized beam does not contain large particles. Because of this, HiPIMS can easily Get a high-quality film layer.
Since the pulse action time is within a few hundred microseconds, the average power is equivalent to that of ordinary magnetron sputtering, which does not increase the requirements for magnetron target cooling. Although the instantaneous power of high-power pulse magnetron sputtering is very high, its average power is not high, so it can be promoted on a large scale. Although so many advantages of pvd coating machine
HiPIMS technology have been introduced, there are still many areas for improvement in this technology in practical applications. However, I believe that with the continuous progress of this technology, it will be widely used in the near future.