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MF sputtering technique has become the mainstream technology of magnetron sputtering, what characteristics superior to the DC sputtering are: Overcome the phenomenon of anode disappearance. Reduce or eliminate the abnormal arc discharge of target, therefore, improve the stability of sputtering process technology, and increase the deposition rate of dielectric coating.
Arc ion coating machine is a high efficiency, harmless and pollution-free machine. It has features of fast deposition rate, great ionization rate, large ion energy, easy operation, low cost and large productive capacity etc.
This series machine is safty, environmental friendly, process stability, rich color film, color uniform, abrasion-resistant, corrosion, high temperature, good adhesion and is not easily fade.
High vacuum evaporation coating machine has the advantages of reasonable structure, high pumping speed, short working cycle, high production efficiency, convenient operation, low energy consumption, stable operation, uniform film layer and good film quality. The machine is widely used in automobile, audio, all kinds of small household appliances, computers, clocks, mobile phones, reflective cups, cosmetics, toys and other industries.
This series machine is safty, environmental friendly, process stability, rich color film, color uniform, abrasion-resistant, corrosion, high temperature, good adhesion and is not easily fade.
This series machine is safty, environmental friendly, process stability, rich color film, color uniform, abrasion-resistant, corrosion, high temperature, good adhesion and is not easily fade.
This series of machine combines cathode arc ion coating technique, magnetron sputtering technique and pulsed bias technique in one machine. This model has become the main technology of hardware coating.
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