HCMS+CA series

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Magnetron sputtering vacuum coating machine

MF sputtering technique has become the mainstream technology of magnetron sputtering, what characteristics superior to the DC sputtering are: Overcome the phenomenon of anode disappearance. Reduce or eliminate the abnormal arc discharge of target, therefore, improve the stability of sputtering process technology, and increase the deposition rate of dielectric coating.

New developed plane target, cylindrical target, twin target, opposite target and various structures of MF sputtering targets. It is widely used in watchband, watchcases, mobile shell, hard wares, tableware etc. It can deposit all kinds of decorative coatings such as TiN, TiC, TiCN, TiAlN, CrN etc decorative coatings.

The machine offers coatings in various metal colors such as steel, nickel, gold, bronze, anthracite and black. The color of the coating is determined by its composition, which is composed of zirconium, titanium, nitrogen, carbon, oxygen and other metals. Our process engineering team can fine tune the color according to your requirements, so that you may be unique in your market.

Product Advantage.

HCMS+CA series magnetron sputtering coating machine includes the following key capabilities:
  • Effective

    The deposition rate is fast

  • Compact

    Small footprint, easy to integrate into the factory

  • Accurate

    Accurate control of plating thickness

  • High quality

    The film has high purity, good compactness and uniformity

  • Diversification

    Mixed sputtering of different metals, alloys and oxides

  • Remote access

    Provide factory remote diagnostics

Mode HCMS-1212
Size Ф1200×H1200mm
Coating Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc
Power supply DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply
Target DC magnetic control target, medium frequency twin target, plane target and cylindrical target
Structure Vertical signal door, vertical double doors
Pump system Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system)
Air system Mass flow controller(1-4road)
Ultimate vacuum 6×10-4pa(no-loading,clean chamber)
Pumping time No-loading from air to 5×10-3pa <13mins
Workpiece motion mode 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation
Control mode Manual+semi-automatic+Automatic integration/touch screen+PLC
Remark We can design the dimension of the equipment according to customers special technique requirement.
Mode HCMS-1612
Size Ф1600×H1200mm
Coating Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc
Power supply DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply
Target DC magnetic control target, medium frequency twin target, plane target and cylindrical target
Structure Vertical signal door, vertical double doors
Pump system Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system)
Air system Mass flow controller(1-4road)
Ultimate vacuum 6×10-4pa(no-loading,clean chamber)
Pumping time No-loading from air to 5×10-3pa <13mins
Workpiece motion mode 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation
Control mode Manual+semi-automatic+Automatic integration/touch screen+PLC
Remark We can design the dimension of the equipment according to customers special technique requirement.
Mode HCMS-1912
Size Ф1900×H1200mm
Coating Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc
Power supply DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply
Target DC magnetic control target, medium frequency twin target, plane target and cylindrical target
Structure Vertical signal door, vertical double doors
Pump system Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system)
Air system Mass flow controller(1-4road)
Ultimate vacuum 6×10-4pa(no-loading,clean chamber)
Pumping time No-loading from air to 5×10-3pa <13mins
Workpiece motion mode 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation
Control mode Manual+semi-automatic+Automatic integration/touch screen+PLC
Remark We can design the dimension of the equipment according to customers special technique requirement.
Mode HCMS-2121
Size Ф2100×H2100mm
Coating Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc
Power supply DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply
Target DC magnetic control target, medium frequency twin target, plane target and cylindrical target
Structure Vertical signal door, vertical double doors
Pump system Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system)
Air system Mass flow controller(1-4road)
Ultimate vacuum 6×10-4pa(no-loading,clean chamber)
Pumping time No-loading from air to 5×10-3pa <13mins
Workpiece motion mode 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation
Control mode Manual+semi-automatic+Automatic integration/touch screen+PLC
Remark We can design the dimension of the equipment according to customers special technique requirement.
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